- All sections
- C - Chemistry; metallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 20/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
Patent holdings for IPC class C08F 20/18
Total number of patents in this class: 476
10-year publication summary
|
16
|
27
|
37
|
64
|
63
|
48
|
38
|
23
|
25
|
8
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| LG Chem, Ltd. | 17205 |
43 |
| FUJIFILM Corporation | 27102 |
18 |
| Zeon Corporation | 3854 |
13 |
| BASF SE | 19740 |
10 |
| DIC Corporation | 3597 |
10 |
| Arkema France | 3790 |
9 |
| Alcon, Inc. | 4899 |
8 |
| Cheil Industries Inc. | 944 |
7 |
| Kuraray Co., Ltd. | 3392 |
7 |
| Sumitomo Chemical Company, Limited | 8808 |
6 |
| Mitsubishi Chemical Corporation | 4313 |
5 |
| Sekisui Chemical Co., Ltd. | 3159 |
5 |
| Evonik Operations GmbH | 3879 |
5 |
| 3m Innovative Properties Company | 18406 |
4 |
| Rohm and Haas Company | 2805 |
4 |
| Capacitor Sciences Incorporated | 65 |
4 |
| Daicel Corporation | 2128 |
4 |
| Nippon Shokubai Co., Ltd. | 1487 |
4 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
4 |
| SWIMC, LLC | 2426 |
4 |
| Other owners | 302 |